Vapor etching to avoid micro-masking by gas-bubbles in wet release of MEMS

Plaza, Alejandro and Maspero, Federico and Cuccurullo, Simone and Pavese, Giulia and Avila, Miguel Angel Badillo and Bertacco, Riccardo (2023) Vapor etching to avoid micro-masking by gas-bubbles in wet release of MEMS. Journal of Micromechanics and Microengineering, 33 (7). 077001. ISSN 0960-1317

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Abstract

We report on the formation of gas bubbles during the release of MEMS devices using buffered oxide etch. Several approaches to mitigate the problem are proposed and tested together with a qualitative study of the phenomenon. The chemical reaction behind such phenomenon and the influence of defects and topography is discussed. Finally, a comparison with the HF-vapor release technique is shown.

Item Type: Article
Subjects: STM Article > Multidisciplinary
Depositing User: Unnamed user with email support@stmarticle.org
Date Deposited: 10 Jun 2023 05:56
Last Modified: 30 Mar 2024 03:59
URI: http://publish.journalgazett.co.in/id/eprint/1497

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